Linewidth fluctuations caused by polymer aggregates in resist films.

• 1 January 1997
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 10  (4) , 635-640
• https://doi.org/10.2494/photopolymer.10.635

Abstract

Keywords

• POLYMER AGGREGATES
• RESIST FILMS
• LINEWIDTH FLUCTUATIONS CAUSED