IBA study of the growth mechanisms of very thin silicon oxide films: the effect of wafer cleaning
- 1 March 1994
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 85 (1-4) , 248-254
- https://doi.org/10.1016/0168-583x(94)95821-1
Abstract
No abstract availableKeywords
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