Electronic diffusion coefficient for fast-ion dechanneling

Abstract
A new local electronic diffusion coefficient for fast-ion dechanneling is derived on the basis of the fundamental method. To reveal detailed effects of electron states, numerical calculations are performed with use of the Roothaan-Hartree-Fock atomic wave functions. It is found that the Lindhard’s formula of the electronic diffusion coefficient, which is proportional to the local electron density, is only a simple approximation of our rigorous formula and that this ‘‘local-density approximation’’ is not always sufficient, especially for metal targets.

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