Monolithic fabrication of flexible film and thinned integrated circuits
- 22 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
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- Control of Thickness Variation in Si-on-Insulator Bonded Wafers by Applying Voltage during KOH EtchingJapanese Journal of Applied Physics, 1996
- Silicon Cantilever Beams Fabricated by Electrochemically Controlled Etching for Sensor ApplicationsJournal of the Electrochemical Society, 1986