Preferred Orientation in Ti Films Sputter-Deposited on SiO2 Glass: The Role of Water Chemisorption on the Substrate
- 1 February 1997
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 36 (2A) , L154-157
- https://doi.org/10.1143/jjap.36.l154
Abstract
Ti thin films have been grown on SiO2 glass layers at 350°C by ultrahigh vacuum magnetron sputtering with a small amount of H2O, H2 or O2 gas introduction to investigate the influence of adsorption on the crystallographic orientation of the Ti films. In situ reflection high-energy electron diffraction (RHEED) and ex situ X-ray diffraction (XRD) studies showed that a water vapor introduction at the beginning of sputter deposition promotes a highly preferred (002) orientation, whereas H2 gas or O2 gas introduction does not affect the orientation. These results indicate that the increase of water chemisorption on the substrate by H2O gas introduction and reduction of the surface free energy enhance the self-assembly of the Ti atoms toward the most stable C-axis orientation.Keywords
This publication has 10 references indexed in Scilit:
- Adsorption and desorption kinetics of H2O on a fully hydroxylated SiO2 surfaceSurface Science, 1996
- A model for thin film texture evolution driven by surface energy effectsPhysica Status Solidi (b), 1996
- Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputteringApplied Physics Letters, 1995
- Highly Preferred [111] Texture in Al Films Deposited on Ultrathin Metal UnderlayersJapanese Journal of Applied Physics, 1992
- Novel aspects of mid and far IR Fourier spectroscopy applied to surface and adsorption studies on SiO2Surface Science, 1987
- Physical and chemical properties of inactive surface hydrogen-bonded hydroxyl groupsJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1984
- Effect of texture and grain structure on electromigration in Al-0.5%Cu thin filmsThin Solid Films, 1981
- Water on silica and silicate surfaces. I. Partially hydrophobic silicasThe Journal of Physical Chemistry, 1973
- Adsorption of Water on SilicaNature, 1969
- The surface structure of silica gelThe Journal of Physical Chemistry, 1968