The role of the plasma in the chemistry of low pressure plasma etchers
- 1 June 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 23 (3) , 436-452
- https://doi.org/10.1109/27.402338
Abstract
No abstract availableThis publication has 41 references indexed in Scilit:
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