Colloid monolayer lithography-A flexible approach for nanostructuring of surfaces
Open Access
- 1 April 1999
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 144-145, 461-466
- https://doi.org/10.1016/s0169-4332(98)00840-x
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Structural Analysis of Self-Assembling Nanocrystal SuperlatticesAdvanced Materials, 1998
- Influence of the Evaporation Rate on the Packing Order of Polydisperse Latex MonofilmsLangmuir, 1997
- Preserving a globular protein shape on glass slides: A self‐assembled monolayer approachAdvanced Materials, 1997
- Structure, Dynamics, and Thermodynamics of Clusters: Tales from Topographic Potential SurfacesScience, 1996
- A Simple Method for the Production of a Two-Dimensional, Ordered Array of Small Latex ParticlesLangmuir, 1995
- Nanosphere lithography: A materials general fabrication process for periodic particle array surfacesJournal of Vacuum Science & Technology A, 1995
- Stripe Patterns Formed on a Glass Surface during Droplet EvaporationLangmuir, 1995
- Phonon diffraction gratingsAnnalen der Physik, 1995
- Mechanism of formation of two-dimensional crystals from latex particles on substratesLangmuir, 1992
- Establishment of the equilibrium shape of metal crystallites on a foreign substrate: Gold on graphiteJournal of Crystal Growth, 1980