New crystalline structure for nanometer-sized Ge microcrystallites prepared by plasma enhanced chemical vapor deposition
- 3 October 1994
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 65 (14) , 1799-1801
- https://doi.org/10.1063/1.112848
Abstract
Crystallized Ge films have been produced in a plasma enhanced chemical vapor deposition system by the decomposition of H2‐diluted GeH4 gas source while using the H2 plasma treatment. Structural analyses of the films using x‐ray diffraction and transmission electron microscopy techniques revealed a new crystalline structure in the Ge microcrystallites with a diameter of about 5 nm, which is different from the normal diamond structure of crystalline Ge. This new nanometer crystalline structure has been explained to be a metastable nanometer‐sized atomic configuration formed in the film deposition process.Keywords
This publication has 10 references indexed in Scilit:
- A Novel Ge Nanostructure Exhibiting Visible PhotoluminescenceChinese Physics Letters, 1993
- Structural evolution during the crystallization process of germanium films prepared by plasma enhanced chemical vapour depositionThin Solid Films, 1993
- On the origin of visible photoluminescence in nanometer-size Ge crystallitesApplied Physics Letters, 1992
- Visible photoluminescence in crystallized amorphous Si:H/SiNx:H multiquantum-well structuresApplied Physics Letters, 1992
- Visible photoluminescence of Ge microcrystals embedded in SiO2 glassy matricesApplied Physics Letters, 1991
- Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafersApplied Physics Letters, 1990
- Quantum size effects on photoluminescence in ultrafine Si particlesApplied Physics Letters, 1990
- Control of silicon network structure in plasma depositionJournal of Non-Crystalline Solids, 1989
- Zero-dimensional "excitons" in semiconductor clustersIEEE Journal of Quantum Electronics, 1986
- Crystal structure and habit of silicon and germanium particles grown in argon gasJournal of Crystal Growth, 1979