Control of morphology and crystallinity of chromium sputtered film
- 25 March 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 134, 1305-1308
- https://doi.org/10.1016/0921-5093(91)90979-w
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Effects of argon pressure and substrate heating on the chromium underlayer used for high-density longitudinal CoNiCr mediaJournal of Vacuum Science & Technology A, 1987
- Texture and morphology of sputtered Cr thin filmsJournal of Applied Physics, 1985
- Facing targets type of sputtering method for deposition of magnetic metal films at low temperature and high rateIEEE Transactions on Magnetics, 1980
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974