Chemical vapor deposition of AlxOyNz films
- 1 June 1975
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 4 (3) , 429-444
- https://doi.org/10.1007/bf02666228
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Silicon Oxynitride Films from the NO-NH[sub 3]-SiH[sub 4] ReactionJournal of the Electrochemical Society, 1973
- Preparation and electrical properties of Al-AlN-Si structuresPhysica Status Solidi (a), 1972
- Solid Solution in the Ternary System, Si3N4-AlN-Al2O3Japanese Journal of Applied Physics, 1972
- The Effect of Electrode on the C-V Hysteresis Behavior of MAS and MAOS StructuresJapanese Journal of Applied Physics, 1972
- Properties of Aluminum Oxide Films Obtained from Nitrous Oxide and Aluminum TrimethylJournal of the Electrochemical Society, 1971
- RF Sputtered Aluminum Oxide Films on SiliconJournal of the Electrochemical Society, 1970
- Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum AlkoxideJournal of the Electrochemical Society, 1967
- Measurement of the thickness and refractive index of very thin films and the optical properties of surfaces by ellipsometryJournal of Research of the National Bureau of Standards Section A: Physics and Chemistry, 1963
- Crystal Phases in the System Al2O3–AlNJournal of the American Ceramic Society, 1961
- THE ATOMIC ARRANGEMENT IN GLASSJournal of the American Chemical Society, 1932