Roughening due to edge diffusion for irreversible aggregation
- 15 November 2000
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 62 (19) , 12636-12639
- https://doi.org/10.1103/physrevb.62.12636
Abstract
We show that fast edge diffusion in a simple kinetic Monte Carlo simulation for epitaxial growth enhances surface roughening for a model of irreversible aggregation. The reason for this is a simple, but rather subtle effect: Faster edge diffusion makes the islands more compact, leading to a significant adatom concentration on top of islands at earlier times. As a consequence, nucleation in higher layers occurs faster, increasing the surface roughness. We also demonstrate that fast edge diffusion can effectively contribute to diffusion of small clusters, and can produce unexpected scaling results.Keywords
This publication has 20 references indexed in Scilit:
- Edge Diffusion during Growth: The Kink Ehrlich-Schwoebel Effect and Resulting InstabilitiesPhysical Review Letters, 1999
- Low-Symmetry Diffusion Barriers in Homoepitaxial Growth of Al(111)Physical Review Letters, 1998
- Anisotropy of Growth of the Close-Packed Surfaces of SilverPhysical Review Letters, 1996
- Dynamics of irreversible island growth during submonolayer epitaxyPhysical Review B, 1994
- Stable and unstable growth in molecular beam epitaxyPhysical Review Letters, 1994
- Reentrant layer-by-layer growth: A numerical studyPhysical Review B, 1993
- Disorder-induced first-order transition in superconducting filmsPhysical Review B, 1992
- Growth kinetics and step density in reflection high-energy electron diffraction during molecular-beam epitaxyJournal of Applied Physics, 1988
- Step Motion on Crystal SurfacesJournal of Applied Physics, 1966
- Atomic View of Surface Self-Diffusion: Tungsten on TungstenThe Journal of Chemical Physics, 1966