X-ray photoelectron spectroscopy and x-ray absorption near-edge spectroscopy study of SiO2/Si(100)
- 1 July 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (4) , 2500-2503
- https://doi.org/10.1116/1.587791
Abstract
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