Substrate treatment and film deposition in ionized and activated gas
- 1 June 1975
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 27 (2) , 185-203
- https://doi.org/10.1016/0040-6090(75)90026-7
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- The behaviour of perfluoropolyether and other vacuum fluids under ion and electron bombardmentNuclear Instruments and Methods, 1973
- Plasma Diagnostics and Energy Transport of a dc Discharge Used for SputteringJournal of Applied Physics, 1972
- The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processesVacuum, 1972
- Reactions of octadecane and decoic acid with clean iron surfacesWear, 1971
- The production of very thin films of stearic and melissic acid by controlled evaporation in vacuumThin Solid Films, 1971
- Thin Film Adhesion: Effect of Glow Discharge on SubstrateThe Journal of Adhesion, 1970
- Discussion: “Developments in Supercleaning and Boundary Lubrication for Gas-Bearing Gyros Related to Surface Phenomena” (Galvin, G. D., Morecroft, D. W., and Patterson, A. G., 1968, ASME J. Lubr. Technol., 90, pp. 850–858)Journal of Lubrication Technology, 1968
- Developments in Supercleaning and Boundary Lubrication for Gas-Bearing Gyros Related to Surface PhenomenaJournal of Lubrication Technology, 1968
- Electron temperature in an a.c. glow discharge in airBritish Journal of Applied Physics, 1965
- The cleaning of glass in a glow dischargeBritish Journal of Applied Physics, 1958