Multipole confined diffusion plasma produced by 13.56 MHz electrodeless source
- 1 November 1989
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 7 (6) , 3345-3350
- https://doi.org/10.1116/1.576148
Abstract
An inductively coupled rf plasma source is shown to produce a large uniform diffusion plasma at low pressures in a reactor surrounded externally by small magnets arranged to produce cusp fields at the walls. Electron densities of >1011 cm−3 can be produced at pressures of <10−3 Torr argon with 800 W input power. With SF6 ion currents of 0.5 mA cm−2 uniform to ±1.5% over 15 cm diameter have been measured at 6×10−4 Torr and 400 W.Keywords
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