The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ)
- 1 November 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 332 (1-2) , 345-350
- https://doi.org/10.1016/s0040-6090(98)91041-0
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Nanoporous Silica for Low k DielectricsMRS Proceedings, 1996