Electrochromic Properties of Niobium Oxide Thin Films Prepared by Chemical Vapor Deposition
- 1 October 1994
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 141 (10) , 2868-2871
- https://doi.org/10.1149/1.2059247
Abstract
Electrochromic niobium oxide thin films were prepared by chemical vapor deposition. The source material was niobium(V) ethoxide. Amorphous niobium oxide thin films were obtained at a substrate temperature 350°C. Reduction and oxidation of the films in a buffer solution resulted in desirable changes in optical absorption. Coulometry indicated that the coloration efficiency was 160 cm2 · C−1.Keywords
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