Electrochromic Properties of Niobium Oxide Thin Films Prepared by Chemical Vapor Deposition

Abstract
Electrochromic niobium oxide thin films were prepared by chemical vapor deposition. The source material was niobium(V) ethoxide. Amorphous niobium oxide thin films were obtained at a substrate temperature 350°C. Reduction and oxidation of the films in a buffer solution resulted in desirable changes in optical absorption. Coulometry indicated that the coloration efficiency was 160 cm2 · C−1.

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