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Summary Abstract: Silicon etching with a hot SF6 molecular beam
Home
Publications
Summary Abstract: Silicon etching with a hot SF6 molecular beam
Summary Abstract: Silicon etching with a hot SF6 molecular beam
KS
Keizo Suzuki
Keizo Suzuki
KN
Ken Ninomiya
Ken Ninomiya
SN
Shigeru Nishimatsu
Shigeru Nishimatsu
OO
Osami Okada
Osami Okada
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1 July 1987
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 5
(4)
,
1605-1606
https://doi.org/10.1116/1.574573
Abstract
No abstract available
Cited
Cited by 2 articles
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