Deposition of Amorphous and Microcrystalline Si,C Alloy Thin Films by a Remote Plasma-Enhanced Chemical-Vapor Deposition Process
- 1 January 1991
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- ¼c Silicon Thin Films Deposited by Remote Plasma Enhanced Chemical Vapor Deposition ProcessMRS Proceedings, 1990
- Blue light emission from a-C:H by thin film electroluminescence structure cellJournal of Non-Crystalline Solids, 1989
- Present and future applications of amorphous silicon and its alloysJournal of Non-Crystalline Solids, 1989