Determination of the Relative Nitrogen Doping Level of Tantalum Nitride Resistor Film by Means of the Seebeck Effect
- 1 September 1972
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Parts, Hybrids, and Packaging
- Vol. 8 (3) , 16-21
- https://doi.org/10.1109/TPHP.1972.1136576
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Spectrophotometric Compositional Analysis of Tantalum–Aluminum Alloy FilmsJournal of Vacuum Science and Technology, 1971