Thermal conduction in metallized silicon-dioxide layers on silicon
- 26 September 1994
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 65 (13) , 1629-1631
- https://doi.org/10.1063/1.112933
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Annealing-temperature dependence of the thermal conductivity of LPCVD silicon-dioxide layersIEEE Electron Device Letters, 1993
- Thermal conductivity of thin SiO2 filmsThin Solid Films, 1992
- Physical origin of negative differential resistance in SOI transistorsElectronics Letters, 1989
- Thermal resistance at interfacesApplied Physics Letters, 1987