Aerosol jet etching of fine patterns
- 28 December 1987
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 51 (26) , 2203-2205
- https://doi.org/10.1063/1.98940
Abstract
Successful demonstration of a new etching technique, aerosol jet etching (AJE), is reported. AJE has been used to pattern fine lines with good anisotropy in silicon dioxide surfaces on silicon substrates using a hydrofluoric acid ultrafine aerosol jet.Keywords
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