High performance 0.25 μm SiGe and SiGe:C HBTs using non selective epitaxy
- 13 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- A high-speed low 1/f noise SiGe HBT technology using epitaxially-aligned polysilicon emittersIEEE Transactions on Electron Devices, 1999