Novel Organic Resists for Nanoscale Imaging. From Chemically Amplified Cycloaliphatic Resists to Dendrimer Monolayer.
- 1 January 1999
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 12 (3) , 405-416
- https://doi.org/10.2494/photopolymer.12.405
Abstract
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