The Best Way to Obtain Good Quality CVD-TiN Films from TiCl4 and NH3
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- LPCVD TiN as Barrier Layer in VLSIJournal of the Electrochemical Society, 1989