Transparent And Heat-Reflecting ZnO:Al Films: Preparation And Optical Properties
- 12 November 1987
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 823, 28-36
- https://doi.org/10.1117/12.941865
Abstract
ZnO:Al films were produced by dual-target reactive magnetron sputtering. The effects of different deposition conditions were investigated. Under optimized conditions, 0.3-pm-thick films had -1% luminous absorptance, ≈85 % thermal infrared reflectance, and a dc resistivity of ≈5 x 10-4 Ω cm. Rutherford Backscattering Spectrometry showed that the Al content was ≈2 at.%. Transmission electron microscopy showed that the crystallite size was ≈50 nm for films deposited onto unheated substrates.Keywords
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