One-step repair of transparent defects in hard-surface photolithographic masks via laser photodeposition

1 June 1980

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters

Vol. 1 (6) , 101-103
https://doi.org/10.1109/edl.1980.25246

Abstract

A technique for simple, one-step correction of transparent defects in hard-surface, photolithographic masks is demonstrated. The correction process uses laser photodetection of a metal film from a metal-alkyl parent gas.

Keywords

GAS LASERS
METALLIZATION
SUBSTRATES
MICROSCOPY
PULSED LASER DEPOSITION
LENSES
LASER BEAMS
SURFACE CONTAMINATION
LITHOGRAPHY

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