HCl Aqueous Solution Diluted with Methanol as an Electrolyte for C‐V Profilings of GaAs and InP

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Abstract
C‐V profiling and net dopant concentration measurement using “Post Office Profile Plotte” have been widely carried out for and other III‐V compound semiconductor materials (1–3). The electrolyte is selected for the material to form an electrical contact to the semiconductor and to react with the semiconductor to remove a given thickness of material per unit charge passed. Tiron electrolyte (2) and a solution of sodium hydroxide and disodium ethylenediamine tetra‐acetate (4) are used for and . In this note, a simple electrolyte of hydrochloric acid aqueous solution diluted with methanol is presented to be useful for , , and . The electrolyte is especially effective for, where the tiron electrolyte often encountered soft breakdown.

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