Auger analysis of chlorine in ``HCl- or Cl2-grown'' SiO2 films
- 15 April 1973
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 22 (8) , 380-381
- https://doi.org/10.1063/1.1654681
Abstract
Auger analysis of SiO2 films thermally grown in O2 in the presence of HCl or Cl2 shows that the incorporated Cl is unstable during the measurement. Cl profiling and mass‐spectrometric sampling indicate that ionized Cl is transported in the electric field to the vacuum‐oxide interface where it is desorbed by high‐energy electrons. This instability restricts the usefulness of the Auger technique.Keywords
This publication has 2 references indexed in Scilit:
- Neutralization of Na+ Ions in ``HCl-Grown'' SiO2Applied Physics Letters, 1972
- The Effect of HCl and Cl[sub 2] on the Thermal Oxidation of SiliconJournal of the Electrochemical Society, 1972