Deposition and characterization of amorphous and micro-crystalline Si,C alloy thin films by a remote plasma-enhanced chemical-vapor deposition process - RPECVD
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 741-744
- https://doi.org/10.1016/s0022-3093(05)80227-3
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The preparation of microcrystalline silicon (μc-Si) thin films by remote plasma-enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1991
- Blue light emission from a-C:H by thin film electroluminescence structure cellJournal of Non-Crystalline Solids, 1989
- Present and future applications of amorphous silicon and its alloysJournal of Non-Crystalline Solids, 1989