Microstructural evolution of a silicon oxide phase in a perfluorosulfonic acid ionomer by an in situ sol–gel reaction

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Abstract
Nanocomposites were produced via sol–gel reactions for tetraethylorthosilicate within the cluster morphology of perfluorosulfonic acid films. Small‐angle x‐ray scattering revealed that the polar/nonpolar nanophase‐separated morphological template persists despite invasion by the silicon oxide phase. Scanning electron microscopy (ESEM–EDAX) studies have indicated that the greatest silicon oxide concentration occurs near the surface and decreases to a minimum in the middle. Optical and ESEM micrographs revealed a brittle, surface‐attached silica layer at high silicon oxide contents. © 1995 John Wiley & Sons, Inc.