An Inductively-Coupled Plasma Source for the Gaseous Electronics Conference Rf Reference Cell
Open Access
- 1 July 1995
- journal article
- Published by National Institute of Standards and Technology (NIST) in Journal of Research of the National Institute of Standards and Technology
- Vol. 100 (4) , 427-439
- https://doi.org/10.6028/jres.100.032
Abstract
In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed in argon, chlorine, and nitrogen at pressures from 0.1 Pa to 3 Pa. For powers deposited in the plasma from 20 W to 300 W, the source produced peak electron densities between 10(10)/cm(3) and 10(12)/cm(3) and electron temperatures near 4 eV. The electron density peaked on axis with typical full-width at half maximum of 7 cm to 9 cm. Discharges in chlorine and nitrogen had bimodal operation that was clearly evident from optical emission intensity. A dim mode occurred at low power and a bright mode at high power. The transition between modes had hysteresis. After many hours of high-power operation, films formed on electrodes and walls of one Cell. These deposits affected the dim-to-bright mode transition, and also apparently caused generation of hot electrons and increased the plasma potential.Keywords
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