Plasma-enhanced chemically vapour-deposited silicon dioxide for metal/oxide/semiconductor structures on InSb
- 1 November 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 97 (1) , 53-61
- https://doi.org/10.1016/0040-6090(82)90416-3
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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