Isotopic exchange in hard amorphous carbonized layers
- 1 January 1990
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (1) , 163-168
- https://doi.org/10.1063/1.345296
Abstract
Hard amorphous films of a-C:H and a-C:D were deposited by a rf glow discharge in either CH4 or CD4 . By ion bombardment with protons and deuterons, the H/D exchange process was studied as function of the bombardment fluence by means of depth profile measurements. The local hydrogen and deuterium contents are not adding up to a constant ‘‘saturation’’ value: the local mixing model is not valid. Instead of that an initial depletion appears, which depends on the incident energy of the ions. At higher fluences, the total (H+D):C ratio tends to increase again, due to an increasing influence of the deposition process. This demonstrates a structural difference between a-C:H films and hydrogen-saturated layers of implanted carbon.This publication has 25 references indexed in Scilit:
- Hydrogen ion-driven permeation in carbonaceous filmsJournal of Nuclear Materials, 1989
- Hydrogen transport and particle-induced hydrogen release in carbonization layersJournal of Nuclear Materials, 1989
- Modeling of hydrogen implantation into graphiteJournal of Applied Physics, 1988
- Graphitization of amorphous diamondlike carbon films by ion bombardmentJournal of Vacuum Science & Technology A, 1988
- Investigation of micropores in amorphous hydrogenated carbon by a pulsed positron beamPhysical Review Letters, 1988
- Thermal gas effusion from hydrogenated amorphous carbon filmsApplied Physics Letters, 1987
- Effects of heavy ion irradiation on amorphous hydrogenated (diamondlike) carbon filmsJournal of Applied Physics, 1987
- Carbonization in tokamaksJournal of Nuclear Materials, 1987
- Hydrogen recycle and isotope exchange from dense carbon filmsJournal of Nuclear Materials, 1987
- Saturation and isotopic replacement of deuterium in low-z materialsJournal of Nuclear Materials, 1980