The effect of the presheath on the ion angular distribution at the wafer surface

• 1 May 1995
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 13  (3) , 859-864
• https://doi.org/10.1116/1.579842

Abstract

Keywords

• ANGULAR DISTRIBUTION
• PRESHEATH
• ION ANGULAR
• WAFER SURFACE
• EFFECT