Integrated processing of amorphous and microcrystalline Si thin film transistors by plasma-assisted chemical-vapor deposition
- 31 August 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 25 (2-4) , 329-336
- https://doi.org/10.1016/0167-9317(94)90033-7
Abstract
No abstract availableKeywords
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