Electrochemical Deposition of a Single Phase of Pure Cu[sub 2]O Films by Current Modulation Methods

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Abstract
The electrodeposition of cuprous oxide (, red copper oxide) on cathode in a weak acidic electrolyte was executed by the current modulation method. The formation mechanism of was investigated by electrochemical characteristics analysis utilizing electrochemical quartz crystal microbalance (EQCM), chronopotentiometry (CP), and pulsed current methods. A scanning electron microscope and X‐ray diffractometer were also used for investigation of the mechanism for film growth. EQCM and CP results indicate that the dissolution potentials of and were different and were used for the selective dissolution of copper when the pulsed anodic current was applied. Pulsed electrodeposition technique offered a useful method in preparing thin film, in which both metal and phases were electrodeposited on platinum electrode, when a higher cathodic current, , was constantly applied in a copper nitrate solution. The cycling of current led to the rapid formation of a single phase of thin film, which was uniform and compact. ©2000 The Electrochemical Society

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