Thermochemical stability diagrams for condensed phases and tabulation of volatile species over condensed phases for thirteen metal-oxygen-silicon systems at 1000 and 1250 K: Volume 2: Final report
- 31 January 1989
- report
- Published by Office of Scientific and Technical Information (OSTI)
Abstract
Thermochemical stability diagrams for oxide and silicide phases in mixed oxidation and silicide forming reactions are useful for the interpretation of the high temperature oxidation reactions which occur. In addition an analysis of the volatile metal and oxide species which develop at the several interfaces are useful in a complete analysis of high temperature oxidation. This work begins with a literature survey of the high temperature oxidation of metal silicides. The major part of the report is a description of the stability diagrams and the volatile species in the Ca-O-Si, C-O-Si, Fe-O-Si, Mn-O-Si, Mo-O-Si, Ni-O-Si, Nb-O-Si, Ta-O-Si, Ti-O-Si, V-O-Si, W-O-Si and Zr-O-Si systems. The importance of forming a SiO/sub 2/(s) film, the volatility of metal and oxide species, the melting points of the condensed phases and the formation of SiO(g) are discussed with regard to the high temperature oxidation of the metal silicides. 37 refs., 16 figs., 19 tabs.Keywords
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