Low resistance dual damascene process by new Al reflow using Nb liner
- 27 November 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Selective and nonselective deposition of aluminum by LPCVD using DMAH and microregion observation of single crystal aluminum with scanning μ-RHEED microscopePublished by Institute of Electrical and Electronics Engineers (IEEE) ,1990