Study on growth processes of particles in germane radio frequency discharges using laser light scattering and scanning electron microscopic methods
- 1 June 1998
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 83 (11) , 5665-5669
- https://doi.org/10.1063/1.367420
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited filmsJournal of Vacuum Science & Technology A, 1996
- Study on growth processes of particulates in helium-diluted silane rf plasmas using scanning electron microscopyApplied Physics Letters, 1994
- Particle nucleation and growth in a low-pressure argon-silane dischargePlasma Sources Science and Technology, 1994
- Diagnostics of particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scatteringPlasma Sources Science and Technology, 1994
- Possible routes for cluster growth and particle formation in RF silane dischargesPlasma Sources Science and Technology, 1994
- Effects of particles on He-SiH4modulated RF dischargesPlasma Sources Science and Technology, 1994
- Investigation of Particulate Growth Processes in RF Silane Plasmas Using Light Absorption and Scanning Electron Microscopic MethodsJapanese Journal of Applied Physics, 1994
- Analysis of high-rate a-Si:H deposition in a VHF plasmaJournal of Physics D: Applied Physics, 1993
- Particulate formation and dusty plasma behaviour in argon-silane RF dischargePlasma Sources Science and Technology, 1993
- Powder dynamics in very high frequency silane plasmasJournal of Vacuum Science & Technology A, 1992