Automatic control of film-deposition rate with the crystal oscillator for preparation of alloy films
- 1 January 1962
- Vol. 12 (1) , 1-9
- https://doi.org/10.1016/0042-207x(62)90818-7
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Method of Measuring and Controlling Evaporation Rates during the Production of Thin Films in VacuumReview of Scientific Instruments, 1961
- Evaporation Rate MonitorReview of Scientific Instruments, 1960
- Instrument for recording the resistance during the deposition of a thin filmJournal of Scientific Instruments, 1960
- Production of Cadmium Sulfide Crystals by Coevaporation in a VacuumJournal of Applied Physics, 1958
- Notizen: Zur Messung von Dampfstrahldichten mittels Ionisationsmanometer beim Aufdampfen dünner SchichtenZeitschrift für Naturforschung A, 1957
- Préparation et étude par diffraction électronique d’alliages métalliques en couches mincesAnnales de Physique, 1956
- Thin Films of Ferromagnetic MaterialsReviews of Modern Physics, 1953
- Oriented arrangements of thin aluminium films formed on ionic substratesDiscussions of the Faraday Society, 1949
- A Method for the Evaporation of AlloysJournal of Applied Physics, 1948
- Röntgenoptische Untersuchungen an dünnen NickelschichtenAnnalen der Physik, 1934