Wet etching of cusp structures for field-emission devices
- 1 November 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 36 (11) , 2709-2714
- https://doi.org/10.1109/16.43777
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- Fabrication of large scale optical components in silicon by reactive ion etchingJournal of Vacuum Science & Technology B, 1987
- Silicon Micromechanical DevicesScientific American, 1983
- Dependence of sputtering coefficient on ion doseRadiation Effects, 1977
- Analytical modelling of sputter induced surface morphologyRadiation Effects, 1977