Fabrication of a high density storage medium for electron beam memory

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Abstract
A new concept for archivalelectron beam memory is being investigated. The storage medium consists of a two dimensional array of columns supported by a thin, electron transparent, membrane. Information is written by melting selected columns with an electron beam. The increase in cross‐sectional area of the resulting droplets provides contrast for electron transmission readout. In this paper, we describe a fabrication process for this storage medium. Gold columns are electroplated into a resist mold defined by electron beam lithography. Proximity effects are controlled by membrane and trilevel resist techniques. Two dimensional arrays of gold columns with 50 nm diameter, 100 nm period and 3:1 aspect ratios have been fabricated on 250 nm thick polyimide membranes.

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