Eliminating interference effects in picosecond photoinduced absorption decays: Application to intrinsic hydrogenated amorphous silicon
- 1 September 1986
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 60 (5) , 1713-1718
- https://doi.org/10.1063/1.337263
Abstract
We measure picosecond photoinduced absorption in a low-defect sample of intrinsic hydrogenated amorphous silicon. Our results indicate that both the imaginary and real parts of the complex index of refraction contribute to the observed decay of the induced transmittance. We present methods for obtaining the undistorted decay of the induced absorption. We show that the decay of the induced absorption depends strongly on the peak carrier density and the repetition rate of the excitation source. The photoinduced absorption decays are consistent with the model for dispersive transport in amorphous materials.This publication has 28 references indexed in Scilit:
- Subnanosecond transient photocurrents in a-Si:H: A probe of thermalization within shallow band-tail statesSolid State Communications, 1985
- Ultrafast time-resolved photoluminescence—a probe of radiative and non-radiative processes in amorphous tetrahedral and chalcogenide semiconductorsPhilosophical Magazine Part B, 1985
- Optical studies of thermalization mechanisms ina-Si:HPhysical Review B, 1985
- Photoluminescence in hydrogenated amorphous siliconPhysical Review B, 1984
- Early photoluminescence decay in-Si: HPhysical Review B, 1984
- Subnanosecond radiative and nonradiative processes in-Si: HPhysical Review B, 1983
- Photoluminescence Decay in Amorphous Silicon AlloysPhysica Status Solidi (a), 1983
- Fast nonradiative recombination in sputtered-Si: HPhysical Review B, 1982
- Picosecond transient photocurrents in amorphous siliconPhysical Review B, 1981
- Recombination in plasma-deposited amorphous Si:H. Luminescence decayPhysical Review B, 1979