Diamond deposition using anX-Y stage in a d.c. plasma jet chemical vapour deposition
- 1 January 1992
- journal article
- Published by Springer Nature in Journal of Materials Science
- Vol. 27 (21) , 5905-5910
- https://doi.org/10.1007/bf01119758
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Substrate Bias Effect on Diamond Deposition by DC Plasma JetJapanese Journal of Applied Physics, 1990
- Diamond Film Preparation by Arc Discharge Plasma Jet Chemical Vapor Deposition in the Methane AtmosphereJournal of the Electrochemical Society, 1990
- High rate synthesis of diamond by dc plasma jet chemical vapor depositionApplied Physics Letters, 1988