Sputter deposition of icosahedral AlMn and AlMnSi
- 31 May 1987
- journal article
- Published by Elsevier in Scripta Metallurgica
- Vol. 21 (5) , 657-662
- https://doi.org/10.1016/0036-9748(87)90380-2
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Nucleation behavior of Al–Mn icosahedral phaseJournal of Materials Research, 1986
- Summary Abstract: IrO2 radio frequency sputtered thin film propertiesJournal of Vacuum Science & Technology A, 1986
- Icosahedral-Phase Formation by Solid-State InterdiffusionPhysical Review Letters, 1986
- Amorphous-to-Quasicrystalline Transformation in the Solid StatePhysical Review Letters, 1985
- Formation of Icosahedral Al(Mn) by Directed Energy ProcessesPhysical Review Letters, 1985
- Metallic Phase with Long-Range Orientational Order and No Translational SymmetryPhysical Review Letters, 1984
- Electrochromic iridium oxide films prepared by reactive sputteringApplied Physics Letters, 1979
- Microstructure of amorphous 304 stainless steel-carbon alloys synthesized by magnetron sputter depositionThin Solid Films, 1979
- The crystal structure of Mn3Al10Acta Crystallographica, 1959