Sub-100 nm Triangular Nanopores Fabricated with the Reactive Ion Etching Variant of Nanosphere Lithography and Angle-Resolved Nanosphere Lithography
- 30 June 2004
- journal article
- Published by American Chemical Society (ACS) in Nano Letters
- Vol. 4 (8) , 1507-1511
- https://doi.org/10.1021/nl049345w
Abstract
No abstract availableKeywords
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