Semiconductor Doping by High Energy 1–2.5 Mev Ion Implantation

• 1 January 1968
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 115  (3) , 307
• https://doi.org/10.1149/1.2411148

Abstract

Keywords

• NITROGEN
• PHOSPHORUS
• ION IMPLANTATION