Stress in SiO2 Films Deposited by Plasma and Ozone Tetraethylorthosilicate Chemical Vapor Deposition Processes
- 1 May 1992
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 139 (5) , 1437-1442
- https://doi.org/10.1149/1.2069426
Abstract
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