Yttria-stabilized zirconia thin films grown by reactive r.f. magnetron sputtering
- 1 October 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 287 (1-2) , 104-109
- https://doi.org/10.1016/s0040-6090(96)08743-3
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Influence of oxygen partial pressure on the metastability of undoped zirconia dispersed in alumina matrixJournal of the European Ceramic Society, 1995
- Deposition and properties of yttria-stabilized zirconia thin films using reactive direct current magnetron sputteringJournal of Vacuum Science & Technology A, 1991
- Characterization of Y-Ba-Cu-O thin films and yttria-stabilized zirconia intermediate layers on metal alloys grown by pulsed laser depositionApplied Physics Letters, 1991
- Epitaxial yttria-stabilized zirconia on (11̄02)sapphire for YBa2Cu3O7−δ thin filmsApplied Physics Letters, 1991
- Epitaxial yttria-stabilized zirconia on hydrogen-terminated Si by pulsed laser depositionApplied Physics Letters, 1990
- Metal buffer layers and Y-Ba-Cu-O thin films on Pt and stainless steel using pulsed laser depositionJournal of Applied Physics, 1990
- Superconducting YBa2Cu3O6.8 films on metallic substrates using in situ laser depositionApplied Physics Letters, 1990
- Modification of zirconia film properties by low-energy ion bombardment during reactive ion-beam depositionJournal of Applied Physics, 1990
- High-rate reactive sputter deposition of zirconium dioxideJournal of Vacuum Science & Technology A, 1988
- Determination of the thickness and optical constants of amorphous siliconJournal of Physics E: Scientific Instruments, 1983