Determination of the hydrogen concentration of silicon nitride layers by Fourier transform infrared spectroscopy
- 1 June 1997
- journal article
- Published by Elsevier in Infrared Physics & Technology
- Vol. 38 (4) , 223-226
- https://doi.org/10.1016/s1350-4495(97)00011-x
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Silicon nitride thin-film deposition by LPCVD with in situ HF vapor cleaning and its application to stacked DRAM capacitor fabricationIEEE Transactions on Electron Devices, 1994
- Dielectric Materials in Semiconductor DevicesJournal of Vacuum Science and Technology, 1969